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Xizmatlar

Quan‐Zhi Zhang

10 ta ish

Dalian University of Technology

AkademScholarda batafsil koʻrsatkichlar

  1. Computer Simulations to Study the Mechanisms of Cold Plasma-Induced Degradation of Amoxicillin

    Otamurot Rajabov, Quan‐Zhi Zhang, Nosir Matyakubov +3

    MaqolaAntibiotics Pharmacokinetics and EfficacyPlasma Chemistry and Plasma Processing20252 iqtibos
    ABI

  2. Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O<sub>2</sub>discharges

    Jia Liu, Quan‐Zhi Zhang, Yong-Xin Liu +2

    Maqola20132 iqtibos
    ABI

  3. Collisionless Bounce Resonance Heating in Dual-Frequency Capacitively Coupled Plasmas

    Yong-Xin Liu, Quan‐Zhi Zhang, Wei Jiang +4

    Maqola20112 iqtibos
    ABI

  4. Observation of nonlinear sheath oscillations in symmetric capacitive discharges at low pressures

    Jing‐Yu Sun, Quan‐Zhi Zhang, You‐Nian Wang

    Maqola20212 iqtibos
    ABI

  5. Role of Direct Plasma Irradiation, Plasma-Activated Liquid, and Plasma-Treated Soil in Plasma Agriculture

    Pankaj Attri, Takamasa Okumura, Nozomi Takeuchi +5

    MaqolaOchiq kirishRadiation Effects and DosimetryPlasma Medicine20230 iqtibos
    ABI

  6. Impurity sputtering model for ICRF edge plasma–surface interactions

    Quan‐Zhi Zhang, Z. W. Liu, Fang‐Fang Ma +2

    MaqolaParticle accelerators and beam dynamicsChinese Physics B20240 iqtibos
    ABI

  7. Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas

    Ming-Yue Han, Fang‐Fang Ma, H. J. Wen +4

    MaqolaOchiq kirishPlasma Diagnostics and ApplicationsJournal of Applied Physics20250 iqtibos
    ABI

  8. Plasma-assisted catalysis for graphene pre-nucleation: the role of high-index nickel nanocrystal surfaces

    Tursunpulat Juraboev, Feruz Khaydarov, Quan‐Zhi Zhang +2

    MaqolaGraphene research and applicationsChemical Physics Letters20250 iqtibos
    ABI

  9. Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

    Yu-Meng Cui, Fang‐Fang Ma, Ziheng Liu +3

    MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films20250 iqtibos
    ABI

  10. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

    Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

    MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena20250 iqtibos
    ABI