Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

2 ta ish

Jurnal · ISSN 0734-2101

1. Investigation of the silicon ion density during molecular beam epitaxy growth

   G. Eifler, E. Kasper, Х. Б. Ашуров +1

   MaqolaSemiconductor materials and devicesJournal of Vacuum Science & Technology A Vacuum Surfaces and Films20021 iqtibos

   ABIABI:AkademIndex/2002.article.000106

2. Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges

   Yu-Meng Cui, Fang‐Fang Ma, Ziheng Liu +3

   MaqolaPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology A Vacuum Surfaces and Films20250 iqtibos

   ABIABI:AkademIndex/2025.article.005077