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Ish: Synthesis of Thermoelectric Manganese Silicide by Mechanical Alloying and Pulse Discharge Sintering

1. Selecting a Target for Obtaining Films of Higher Manganese Silicide Using Magnetron Sputtering

   М. S. Lukasov, Н. А. Архарова, Andrey Orekhov +2

   MaqolaSemiconductor materials and interfacesCrystallography Reports20240 iqtibos

   ABIABI:AkademIndex/2024.article.007559

2. Selecting a target for obtaining films of higher manganese silicide using magnetron sputtering

   М. S. Lukasov, Н. А. Архарова, Anton S. Orekhov +2

   MaqolaOAOchiq kirishSemiconductor materials and interfacesКристаллография20240 iqtibos

   ABIABI:AkademIndex/2024.article.008195