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Investigation of the Magnesium Silicide -- Mg<sub>2</sub>Si Films

T. S. KamilovTashkent State Aviation Institute, Tashkent, UzbekistanD.K. KabilovTashkent State Aviation Institute, Tashkent, UzbekistanR.Kh. KamilovaTashkent State Aviation Institute, Tashkent, UzbekistanM.E. AzimovKokan State Pedagogical Institute, Kokan, UzbekistanV. V. KlechkovskayaShubnikov Institute of Crystallography, Moscow, RussiaAndrey OrekhovShubnikov Institute of Crystallography, Moscow, RussiaElena I. SuvorovaShubnikov Institute of Crystallography, Moscow, Russia
2006en
ABI

Annotatsiya

The silicides are ecologically friendly materials and they have a mechanical stability to corrosion, oxidation, decay and aggressive environments. It is known that a bulk magnesium silicide - Mg <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Si demonstrates semiconductor conductivity n-type character with energy band gap E <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">g</sub> =0.78 eV and solid solution based on the Mg <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Si-Mg <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Sn have figure of merit of ZT>1 [Samsonov, et. al. 1979]. Only small part of articles has devoted to thin Mg <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> Si films on silicon. In this work the magnesium silicide films have been grown on silicon substrate by reactive diffusion method and their thermoelectric properties were investigated

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