Ushbu ish iqtibos qilgan ishlar

26 ta ish

Ish: Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

1. Fluid simulation and experimental validation of plasma radial uniformity in 60 MHz capacitively coupled nitrogen discharges

   Ying-Shuang Liang, Yong-Xin Liu, Yu‐Ru Zhang +1

   Maqola20152 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418063

2. Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

   Xiangzhan Jiang, Yong-Xin Liu, Wenqi Lu +3

   Maqola20112 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418064

3. Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges

   Yong-Xin Liu, Fei Gao, Jia Liu +1

   Maqola20142 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418066

4. Very high frequency capacitively coupled discharges for large area processing

   M. Meyyappan, Michael Colgan

   Maqola19962 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418067

5. Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

   Harald Schmidt, L. Sansonnens, A.A. Howling +3

   Maqola20042 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418072

6. Enhanced Plasma Uniformity in RF Plasma With Side Multihole

   Hyo‐Chang Lee, Chin‐Wook Chung

   Maqola20142 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418073

7. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

   Emi Kawamura, De‐Qi Wen, M. A. Lieberman +1

   Maqola20172 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418075

8. Spatial symmetry breaking in single-frequency CCP discharge with transverse magnetic field

   Sarveshwar Sharma, Igor Kaganovich, Alexander V. Khrabrov +2

   Maqola20182 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418076

9. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

   Shinji Yamada, Masato Omori, Hideki Sakurai +5

   Maqola20192 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418079

10. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

    Jicheng Zhou, Jia Liao, Jing Huang +3

    Maqola20212 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418086

11. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418065

12. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418068

13. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418069

14. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418070

15. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418071

16. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418074

17. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418077

18. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418078

19. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418080

20. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418081

21. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418082

22. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418083

23. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418084

24. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418085

25. Sarlavhasiz

    Boshqa1 iqtibos

    ABIABI:AkademIndex/openalex/2026.other.418087