Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma
Xiangzhan JiangSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of ChinaYong-Xin LiuSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of ChinaWenqi LuSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of ChinaZhenhua BiSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of ChinaFei GaoSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of ChinaYou‐Nian WangSchool of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of China
2011en
ABI
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