Ushbu ishga iqtibos qilgan ishlar

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Ish: Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

1. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

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2. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

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   ABIABI:AkademIndex/openalex/2025.article.009577