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Ish: Effect of Electron Bombardment on the Composition and Structure of CaF2/Si(111) Films
Electronic structure and optical properties of CaF2 films under low energy Ba+ ion-implantation combined with annealing
Б. Е. Умирзаков, T.S. Pugacheva, A.T. Tashatov +1
MaqolaInorganic Fluorides and Related CompoundsNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms200016 iqtibosABIStudy of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Д. А. Ташмухамедова, M. B. Yusupjanova, A. K. Tashatov +1
MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20185 iqtibosABI