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Ish: ITO Films Deposited on Silicon by CVD Method
Physical properties of RF sputtered ITO thin films and annealing effect
L. Kerkache, A. Layadi, El Hadj Dogheche +1
Maqola20053 iqtibosABIPulsed laser deposition of ITO thin films and their characteristics
Dmitry Zuev, А. А. Лотин, O. A. Novodvorsky +7
Maqola20122 iqtibosABIEffect of ion treatment on the properties of In2O3:Sn films
P. N. Krylov, Р. М. Закирова, И. В. Федотова +1
Maqola20132 iqtibosABI