Ushbu ishga iqtibos qilgan ishlar

3 ta ish

Ish: Preparation of manganese silicide thin films by solid phase reaction

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   MaqolaSemiconductor materials and interfaces20053 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.424565

2. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   MaqolaSemiconductor materials and interfacesTechnical Physics20102 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.199251

3. Growth technique and structural properties of the higher manganese silicide films

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +3

   MaqolaSemiconductor materials and interfaces20051 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.609626