Maqola

The radiation stimulated diffusion role in high dose, low energy, high temperature ion implantation

S.H. ValievThermophysics Department of Academy of Sciences of Uzbekistan, Tashkent, UzbekistanT.S. PugachevaTashkent State Technical University, Universitetskaja 2, Tashkent 700095, UzbekistanF.G. JurabekovaTashkent State Technical University, Universitetskaja 2, Tashkent 700095, UzbekistanS.A. LemTashkent State Technical University, Universitetskaja 2, Tashkent 700095, UzbekistanY. MiyagawaNational Industrial Research Institute of Nagoya, Nagoya, Japan

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atomsjournal1997en

ABI

Annotatsiya

Annotatsiya mavjud emas.

Mavzular

Silicon and Solar Cell Technologies Ion-surface interactions and analysis Integrated Circuits and Semiconductor Failure Analysis

Identifikatorlar

DOI: 10.1016/s0168-583x(96)00937-8

Iqtiboslar va manbalar

1 ta iqtibos 12 ta foydalanilgan manba

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