Spectral Photosensitivity ofpSi—n(ZnSe)1 −x−y (Si2) x (GaP) y Structures
Annotatsiya
Epitaxial layers of substitutional solid solution (ZnSe)1−x−y(Si2) x (GaP) y (0.1 ≤x≤ 1, 0≤y≤0.9) on pSi substrates were developed from a limited volume of tin solution-melt using the method of a liquid phase epitaxy. The spectral dependency of photosensitivity of the pSi—n(ZnSe)1 −x−y (Si2) x (Ga.P) y structures was studied and the peaks of photoresponses at energies of photons of 1.6, 1.66, and 1.92 eV at room temperature were discovered. It was shown that the forward-bi as regions of the volt—ampere characteristics of structures under study can be described by the power dependence of −I = I 0 + B · V m with various values of a power index at various values of the voltage applied.
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