Article

Obtaining of epitaxial films of metal silicides by ion implantation and molecular beam epitaxy

Б. Е. УмирзаковTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanД. А. ТашмухамедоваTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanE.U. BoltaevTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanA.A. DzhurakhalovArifov Institute of Electronics, F. Khodjaev Str. 33, 700125 Tashkent, Uzbekistan

Materials Science and Engineering Bjournal2003en

ABI

Abstract

No abstract available.

Topics

Semiconductor materials and interfaces Silicon Nanostructures and Photoluminescence Chalcogenide Semiconductor Thin Films

Identifiers

DOI: 10.1016/s0921-5107(02)00677-3

Citations and references

Cited by 14 6 references

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