Мақола

Obtaining of epitaxial films of metal silicides by ion implantation and molecular beam epitaxy

Б. Е. УмирзаковTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanД. А. ТашмухамедоваTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanE.U. BoltaevTashkent State Technical University, University Str. 2, 700095 Tashkent, UzbekistanA.A. DzhurakhalovArifov Institute of Electronics, F. Khodjaev Str. 33, 700125 Tashkent, Uzbekistan

Materials Science and Engineering Bjournal2003en

ABI

Аннотация

Аннотация мавжуд эмас.

Мавзулар

Semiconductor materials and interfaces Silicon Nanostructures and Photoluminescence Chalcogenide Semiconductor Thin Films

Идентификаторлар

DOI: 10.1016/s0921-5107(02)00677-3

Иқтибослар ва манбалар

14 та иқтибос 6 та фойдаланилган манба

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