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High Energy Resolution Detectors Based on 4H-SiC

Alexander M. IvanovRussian Academy of SciencesEvgenia V. KalininaIoffe Physicotechnical Institute RASG. KholuyanovIoffe Physicotechnical Institute RASN. B. StrokanRussian Academy of SciencesGrigory OnushkinIOFFE InstituteAndrey O. KonstantinovAnders HallénKTH Royal Institute of TechnologyAndrej KuznetsovUniversity of Oslo
Materials science forumbook series2005en
ABI

Abstract

The spectrometric characteristics of the detectors based on 4H-SiC using 4.8-7.7 MeV a-particles were determined. The Cr Schottky barriers with areas of 1×10-2 cm2 were performed^by vacuum thermal evaporation on 4H-SiC epitaxial layers grown by chemical vapor deposition (CVD) with thickness 26 and 50 µm. The concentrations of the uncompensated donors into CVD epitaxial layers were (6-10) ×1014 cm-3, that allowed to develop a detector depletion region up to 30 µm using reverse bias of 400 V. The energy resolution less than 20 keV (0.34%) for lines of 5.0- 5.5 MeV was achieved that is twice as large of the resolution of high-precision Si-based detectors prepared on specialized technology. The maximum signal amplitude of 4H-SiC - detectors corresponding to the average electron-hole pair generation energy was found to be 7.70 eV.

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