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Works cited by this work

9 works

Work: Selecting a target for obtaining films of higher manganese silicide using magnetron sputtering

  1. The Influence of Structural Defects in Silicon on the Formation of Photosensitive Mn4Si7–Si❬Mn❭–Mn4Si7 and Mn4Si7–Si❬Mn❭–M Heterostructures

    T. S. Kamilov, А.С. Рысбаев, V. V. Klechkovskaya +3

    ArticleSemiconductor materials and interfacesApplied Solar Energy201921 citations
    ABI

  2. Obtaining higher manganese silicide films with high thermoelectric properties

    I. R. Bekpulatov, D.S. Shomukhammedova, Д. М. Шукурова +1

    ArticleSemiconductor materials and interfacesE3S Web of Conferences20239 citations
    ABI

  3. Composites of Higher Manganese Silicides and Nanostructured Secondary Phases and Their Thermoelectric Properties

    Aijun Zhou, Xingang Zhao, Tiejun Zhu +4

    Article20092 citations
    ABI

  4. Synthesis of Thermoelectric Manganese Silicide by Mechanical Alloying and Pulse Discharge Sintering

    Takashi Itoh, Masataka Yamada

    Article20092 citations
    ABI

  5. Thermoelectric Properties of Cold-Pressed Higher Manganese Silicides for Waste Heat Recovery

    Xi Chen, Annie Weathers, Arden L. Moore +2

    Article20122 citations
    ABI

  6. Directional thermoelectric properties of Ru2Si3

    B.A. Simkin, Yoshinori Hayashi, H. Inui

    Article20052 citations
    ABI

  7. Surfactant mediated growth of MnSi1.7 layers on (001)Si

    Anna Mogilatenko, M. Falke, S. Teichert +3

    Article20022 citations
    ABI

  8. Структура термоэлектрических пленок высшего силицида марганца на кремнии по данными электронной микроскопии

    Anton S. Orekhov, Т.С. Камилов, Б.В. Ибрагимова +2

    Article20172 citations
    ABI

  9. Untitled

    Other1 citations
    ABI