Investigation of the dose dependence of the amorphization of a Si(111) surface bombarded with low-energy Na+ ions
S. J. NimatovTashkent State Technical University, Universitetskaya ul. 2, Tashkent, 100095, UzbekistanД. С. РумиResearch and Technology Company PROTON, Parkentskaya ul. 51, Tashkent, 100007, Uzbekistan
ABI
Аннотация
A comparative analysis of the results of experiments on Si(111) surface amorphization by Na+ ions and earlier works on simulation of the process is carried out. The calculated parameters of the model satisfactorily explain the experimental characteristics throughout almost the entire energy range of E i = 100–1200 eV, except for the region of dominant silicide formation (300–500 eV) not considered by the formalism of the used program.
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