Работы, цитирующие эту работу

Работ: 2

Работа: Manganese depth-concentration profiles in ion-implanted silicon studied by Rutherford backscattering

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   ABIABI:AkademIndex/openalex/2026.other.144568

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   Utkirjon Sharopov, Tukhtamurod Juraev, Siddik Kakhkhorov +8

   Обзорная статьяAdvancements in Battery MaterialsIonics2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.review-article.000048