Работы, на которые ссылается эта работа

Работ: 7

Работа: On the growth of higher manganese silicide films on silicon

1. Thin Films—Interdiffusion and Reactions

   J. M. Poate, K. N. Tu, Jean-Claude Mayor +1

   Статья1979Цитирований: 5

   ABIABI:AkademIndex/openalex/2026.other.424562

2. Preparation of manganese silicide thin films by solid phase reaction

   Jin‐Liang Wang, Masaaki Hirai, M. Kusaka +1

   Статья1997Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.424563

3. Localized epitaxial growth of MnSi1.7 on silicon

   Yiling Lian, L. J. Chen

   Статья1986Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.424564

4. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   СтатьяSemiconductor materials and interfaces2005Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.424565

5. Studies of formation of silicides and their barrier heights to silicon

   Karl‐Ragnar Sundström, S. Petersson, P.A. Tove

   Статья1973Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.424566

6. An optical determination of the bandgap of the most silicon-rich manganese silicide phase

   M. Bost, John E. Mahan

   Статья1987Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.095291

7. Formation and Schottky behavior of manganese silicides on <i>n</i>-type silicon

   M. Eizenberg, K. N. Tu

   Статья1982Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.424561