Работы, цитирующие эту работу

Работ: 2

Работа: Microstructure and mechanical properties of Ti5Si3 fabricated by spark plasma sintering

1. Study of the electrophysical properties of higher manganese silicide (Mn4Si7) thin films and their temperature dependence

   I. R. Bekpulatov, Gunel Imanova, D.Kh. Nabiev +4

   СтатьяSemiconductor materials and interfacesCeramics International2025Цитирований: 5

   ABIABI:AkademIndex/openalex/2025.article.000626

2. Study of Mn4Si7 silicide crystals obtained by hot isostatic pressing and spark plasma sintering methods in an X-ray diffractometer

   Б.Д. Игамов, A.I. Kamardin, D.Kh. Nabiev +7

   СтатьяSemiconductor materials and interfacesJournal of Materials Science Materials in Engineering2025Цитирований: 4

   ABIABI:AkademIndex/openalex/2025.article.000878