Работы, цитирующие эту работу

Работ: 3

Работа: Evaluation of the Topographical Surface Changes of Silicon Wafers after Annealing and Plasma Cleaning

1. Controlling the Low-temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   СтатьяIon-surface interactions and analysisSilicon2021Цитирований: 11

   ABIABI:AkademIndex/openalex/2026.other.144468

2. Formation of defects on the surface of LiF crystals under irradiation with different ions mass

   Utkirjon Sharopov, Umid Gopparov, K. Yu. Rashidov +8

   СтатьяIon-surface interactions and analysisRadiation effects and defects in solids2022Цитирований: 9

   ABIABI:AkademIndex/openalex/2026.other.144479

3. Controlling the Low-Temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   ПрепринтSemiconductor materials and devicesResearch Square2021Цитирований: 1

   ABIABI:AkademIndex/openalex/2026.other.365538