Работы, цитирующие эту работу

Работ: 2

Работа: The impact of deposition and annealing temperature on the growth properties and surface passivation of silicon dioxide films obtained by atomic layer deposition

1. Controlling the Low-temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   СтатьяIon-surface interactions and analysisSilicon2021Цитирований: 11

   ABIABI:AkademIndex/openalex/2026.other.144468

2. Controlling the Low-Temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   ПрепринтSemiconductor materials and devicesResearch Square2021Цитирований: 1

   ABIABI:AkademIndex/openalex/2026.other.365538