H.H. Husnutdinova

2 та иш

Tashkent State Aviation Institute, Tashkent, Uzbekistan

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   МақолаSemiconductor materials and interfaces20053 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.424565

2. Growth technique and structural properties of the higher manganese silicide films

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +3

   МақолаSemiconductor materials and interfaces20051 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.609626