В. М. Ротштейн

2 та иш

Arifov Institute of Electronics, Academy of Sciences of Uzbekistan, ul. Durmon iuli 33, 100125, Tashkent, Uzbekistan

1. Fragmentation of sputtered vanadium and niobium cluster ions, kinetic release and dissociation energy

   Н. Х. Джемилев, В. М. Ротштейн, О. Ф. Тукфатуллин +1

   Мақолаnanoparticles nucleation surface interactionsJournal of Analytical Chemistry20110 иқтибос

   ABIABI:AkademIndex/openalex/2011.article.000415

2. Composition and Morphology of A Si(111) Surface with a SiO2 Surface Film of Different Thicknesses

   Б. Е. Умирзаков, S. B. Donaev, R. M. Yorkulov +2

   МақолаSilicon Nanostructures and PhotoluminescenceSemiconductors20220 иқтибос

   ABIABI:AkademIndex/openalex/2022.article.002267