Ушбу ишга иқтибос қилган ишлар

3 та иш

Иш: Preparation of manganese silicide thin films by solid phase reaction

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   МақолаSemiconductor materials and interfaces20053 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.424565

2. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   МақолаSemiconductor materials and interfacesTechnical Physics20102 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.199251

3. Growth technique and structural properties of the higher manganese silicide films

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +3

   МақолаSemiconductor materials and interfaces20051 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.609626