Ушбу иш иқтибос қилган ишлар

5 та иш

Иш: Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures

1. Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing

   Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков

   МақолаSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.196457

2. Analysis of profiles of atomic distribution over the depth of Si-Me free nanofilm systems

   Б. Е. Умирзаков, З. А. Исаханов, М. К. Рузибаева +2

   МақолаSemiconductor materials and interfacesTechnical Physics20155 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.495098

3. Ion Implantation

   H. Ryssel

   Китоб19733 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.351368

4. Depth profiles of metal ions implanted in dielectrics at low energies

   А. Л. Степанов, В. А. Жихарев, И. Б. Хайбуллин

   Мақола20012 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.158193

5. Energy distribution of metal and noble gas ions traversing single-crystal copper films

   З. А. Исаханов

   МақолаIon-surface interactions and analysisTechnical Physics20122 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.531187