Nobuhiro Hata

2 ta ish

Fizika-Texnika Instituti

1. Deposition and extensive light soaking of highly pure hydrogenated amorphous silicon

   Toshihiro Kamei, Nobuhiro Hata, Akihisa Matsuda +5

   Maqola19962 iqtibos

   ABIABI:AkademIndex/2026.other.651610

2. Light-Induced Degradation Effects in a-Si:H Observed by Raman Scattering Measurements

   Paul Stradins, Michio Kondo, Nobuhiro Hata +1

   MaqolaThin-Film Transistor TechnologiesMRS Proceedings19980 iqtibos

   ABIABI:AkademIndex/1998.article.000157