Andrzej Kubiak

2 ta ish

Lodz University of Technology

1. Boron and aluminum diffusion into 4H–SiC substrates

   Andrzej Kubiak, Jacek Rogowski

   Maqola20102 iqtibos

   ABIABI:AkademIndex/2026.other.498853

2. Suppression of thermal donors in silicon by nickel impurity atoms

   B. K. Ismaylov, Nurullo Zikrillaev, Katarzyna Znajdek +5

   MaqolaOAOchiq kirish20260 iqtibos

   ABIABI:AkademIndex/2026.article.098789