B. Ch. Holliev
1 ta ish
Tashkent State Technical University, ul. Universitetskaya 2, Tashkent, 700095, Republic of Uzbekistan
Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Б. Э. Эгамбердиев, B. Ch. Holliev, A. S. Mallaev +2
MaqolaSemiconductor materials and interfacesSurface Engineering and Applied Electrochemistry20070 iqtibosABI