Б. Э. Эгамбердиев
19 ta ish
Technical University of Tashkent, 100095, Tashkent, Uzbekistan
Defect Formation and Displacement of Atoms on the Surface of a LiF Crystal under Bombardment with Low-Energy Cesium Ions
Utkirjon Sharopov, O. A. Abdulkhaev, Б. Э. Эгамбердиев +11
MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20242 iqtibosABIObtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Б. Э. Эгамбердиев, B. Ch. Holliev, A. S. Mallaev +2
MaqolaSemiconductor materials and interfacesSurface Engineering and Applied Electrochemistry20070 iqtibosABIInvestigation of profiles of the distribution of ion-implanted Mn atoms using the rutherford back scattering method and the influence of thermal annealing on them
Б. Э. Эгамбердиев, Б.Ч. Холлиев, A. S. Mallaev
MaqolaIon-surface interactions and analysisSurface Engineering and Applied Electrochemistry20070 iqtibosABIDISTRIBUTION PROFILES ON THE CRYSTAL STRUCTURE OF THE SURFACE AND AT THE SURFACE OF SILICON DOPED WITH IONS FROM THERMAL ANNEALING OF IRON AND COBALT
Б. Э. Эгамбердиев, Sh. A. Sayfulloev, A. S. Mallaev
MaqolaSemiconductor materials and interfacesJournalNX - A Multidisciplinary Peer Reviewed Journal20210 iqtibosABIDetermining the Effect of Annealing on the Crystal Structure of CoSi2/Si (100) Formed by MBE, SSE and RE Epitaxy Techniques
Б. Э. Эгамбердиев, A. Sh. Mavlyanov, Sh. A. Sayfulloyev
BobSemiconductor materials and interfacesBook Publisher International (a part of SCIENCEDOMAIN International)20210 iqtibosABI