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Ushbu ishga iqtibos qilgan ishlar
2 ta ish
Ish: Change of electrophysical properties of the Si(111) and Si(100) surface in the process of ion implantation and next annealing
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Xizmatlar
Ishlab chiquvchilar uchun
2 ta ish
Ish: Change of electrophysical properties of the Si(111) and Si(100) surface in the process of ion implantation and next annealing