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9 ta ish

Ish: Effects of cascade mixing, sputtering and diffusion by high dose light ion irradiation of boron nitride

  1. THE STOPPING AND RANGE OF IONS IN SOLIDS

    J. F. Ziegler

    Bob198815 iqtibos
    ABI

  2. The Stopping and Range of Ions in Matter

    James F. Ziegler, J.P. Biersack

    Bob198510 iqtibos
    ABI

  3. Computer simulation of two-component target sputtering

    W. Eckstein, J.P. Biersack

    Maqola19854 iqtibos
    ABI

  4. Computer simulation of SiC and B4C sputtering by Ar+ and He+ ions bombardment

    T.S. Pugacheva, F.G. Jurabekova, Y. Miyagawa +1

    MaqolaIon-surface interactions and analysisNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms19973 iqtibos
    ABI

  5. Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids

    W. Möller, W. Eckstein, J.P. Biersack

    Maqola19883 iqtibos
    ABI

  6. A Modified Stopping Power Formula of Firsov

    Haruo Sugiyama

    Maqola19772 iqtibos
    ABI

  7. Computer simulation of dose effects on composition profiles under ion implantation

    Y. Miyagawa, M. Ikeyama, Kazuki Saito +2

    Maqola19912 iqtibos
    ABI

  8. Dynamic behavior of implanted nitrogen in zirconium at various stages of implantations

    Y. Miyagawa, Yousuke Sakai, M. Ikeyama +3

    Maqola19942 iqtibos
    ABI

  9. The radiation stimulated diffusion role in high dose, low energy, high temperature ion implantation

    S.H. Valiev, T.S. Pugacheva, F.G. Jurabekova +2

    MaqolaSilicon and Solar Cell TechnologiesNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms19971 iqtibos
    ABI