Ushbu ish iqtibos qilgan ishlar

33 ta ish

Ish: Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

1. Fluid simulation and experimental validation of plasma radial uniformity in 60 MHz capacitively coupled nitrogen discharges

   Ying-Shuang Liang, Yong-Xin Liu, Yu‐Ru Zhang +1

   Maqola20152 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418063

2. Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

   Xiangzhan Jiang, Yong-Xin Liu, Wenqi Lu +3

   Maqola20112 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418064

3. Experimental observation of standing wave effect in low-pressure very-high-frequency capacitive discharges

   Yong-Xin Liu, Fei Gao, Jia Liu +1

   Maqola20142 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418066

4. Very high frequency capacitively coupled discharges for large area processing

   M. Meyyappan, Michael Colgan

   Maqola19962 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418067

5. Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

   Harald Schmidt, L. Sansonnens, A.A. Howling +3

   Maqola20042 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418072

6. Enhanced Plasma Uniformity in RF Plasma With Side Multihole

   Hyo‐Chang Lee, Chin‐Wook Chung

   Maqola20142 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418073

7. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

   Emi Kawamura, De‐Qi Wen, M. A. Lieberman +1

   Maqola20172 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418075

8. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

   Shinji Yamada, Masato Omori, Hideki Sakurai +5

   Maqola20192 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418079

9. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

   Jicheng Zhou, Jia Liao, Jing Huang +3

   Maqola20212 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.418086

10. Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

    Sen 森 WANG 王, Quanzhi 权治 ZHANG 张, Fangfang 方方 MA 马 +2

    MaqolaPlasma Diagnostics and ApplicationsPlasma Science and Technology20241 iqtibos

    ABIABI:AkademIndex/openalex/2024.article.001767

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    ABIABI:AkademIndex/openalex/2026.other.793136

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    ABIABI:AkademIndex/openalex/2026.other.793137

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    ABIABI:AkademIndex/openalex/2026.other.793138

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    ABIABI:AkademIndex/openalex/2026.other.793139

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    ABIABI:AkademIndex/openalex/2026.other.793140

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    ABIABI:AkademIndex/openalex/2026.other.793141

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    ABIABI:AkademIndex/openalex/2026.other.793142

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    ABIABI:AkademIndex/openalex/2026.other.793143

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    ABIABI:AkademIndex/openalex/2026.other.793144

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    ABIABI:AkademIndex/openalex/2026.other.793145

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    ABIABI:AkademIndex/openalex/2026.other.793146

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    ABIABI:AkademIndex/openalex/2026.other.793147

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    ABIABI:AkademIndex/openalex/2026.other.793148

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    ABIABI:AkademIndex/openalex/2026.other.793149

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    ABIABI:AkademIndex/openalex/2026.other.793150