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11 ta ish

Ish: Procedure for determining defects in sputtered clusters of ionic crystals

  1. Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing

    Utkirjon Sharopov, Б.Г. Атабаев, R. Djabberganov +1

    MaqolaElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201311 iqtibos
    ABI

  2. Mechanism for the formation of molecular clusters under ion sputtering

    Н. Х. Джемилев

    MaqolaIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20127 iqtibos
    ABI

  3. The mechanisms of sputtering part I.

    Roger Kelly

    Maqola19844 iqtibos
    ABI

  4. Electron stimulated desorption of neutral species from (100) KCl surfaces

    Marek Szymoński, A. Poradzisz, P. Czuba +5

    Maqola19923 iqtibos
    ABI

  5. On the mechanism of cluster emission in sputtering

    K. Wittmaack

    Maqola19793 iqtibos
    ABI

  6. Potential Sputtering of Lithium Fluoride by Slow Multicharged Ions

    T. Neidhart, Franz Pichler, F. Aumayr +3

    Maqola19952 iqtibos
    ABI

  7. Positive-ion production by electron bombardment of alkali halides

    R. E. Walkup, Phaedon Avouris, Aryya Ghosh

    Maqola19872 iqtibos
    ABI

  8. Defect mediated sputtering of amorphous LiF induced by low-energy ion bombardment

    N. Seifert, Qun Yan, A. V. Barnes +5

    Maqola19952 iqtibos
    ABI

  9. Threshold for Potential Sputtering of LiF

    G. Hayderer, Michael Schmid, П. Варга +7

    Maqola19992 iqtibos
    ABI

  10. The role of defect diffusion and metallization for electron-stimulated desorption from CaF2

    Michael Reichling

    Maqola19952 iqtibos
    ABI

  11. Sarlavhasiz

    Boshqa1 iqtibos
    ABI