Работы, на которые ссылается эта работа

Работ: 11

Работа: Procedure for determining defects in sputtered clusters of ionic crystals

Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing
Utkirjon Sharopov, Б.Г. Атабаев, R. Djabberganov +1
СтатьяElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2013Цитирований: 11
ABI
Mechanism for the formation of molecular clusters under ion sputtering
Н. Х. Джемилев
СтатьяIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2012Цитирований: 7
ABI
The mechanisms of sputtering part I.
Roger Kelly
Статья1984Цитирований: 4
ABI
Electron stimulated desorption of neutral species from (100) KCl surfaces
Marek Szymoński, A. Poradzisz, P. Czuba +5
Статья1992Цитирований: 3
ABI
On the mechanism of cluster emission in sputtering
K. Wittmaack
Статья1979Цитирований: 3
ABI
Potential Sputtering of Lithium Fluoride by Slow Multicharged Ions
T. Neidhart, Franz Pichler, F. Aumayr +3
Статья1995Цитирований: 2
ABI
Positive-ion production by electron bombardment of alkali halides
R. E. Walkup, Phaedon Avouris, Aryya Ghosh
Статья1987Цитирований: 2
ABI
Defect mediated sputtering of amorphous LiF induced by low-energy ion bombardment
N. Seifert, Qun Yan, A. V. Barnes +5
Статья1995Цитирований: 2
ABI
Threshold for Potential Sputtering of LiF
G. Hayderer, Michael Schmid, П. Варга +7
Статья1999Цитирований: 2
ABI
The role of defect diffusion and metallization for electron-stimulated desorption from CaF2
Michael Reichling
Статья1995Цитирований: 2
ABI
Без названия
ДругоеЦитирований: 1
ABI