Advancements in Photolithography Techniques

8 works

1. Transverse focusing of electrons in the presence of plane defects terminating at the specimen surface

   S. A. Korzh

   ArticleElectron and X-Ray Spectroscopy TechniquesSoviet Journal of Low Temperature Physics19810 citations

   ABIABI:AkademIndex/openalex/1981.article.000180

2. Measurement of the internal conversion electron lines by the track counting technique

   T.A. Islamov, V. G. Kalinnikov, N. T. Kambarova +6

   ArticleElectron and X-Ray Spectroscopy TechniquesTechnical Physics Letters20010 citations

   ABIABI:AkademIndex/openalex/2001.article.000260

3. Measurement of the Background Level in the Spectra of Internal-Conversion Electrons Using the МАС-1 Microscope Complex

   D. D. Bogachenko, I. V. Gaidaenko, O. K. Egorov +5

   ArticleElectron and X-Ray Spectroscopy TechniquesInstruments and Experimental Techniques20040 citations

   ABIABI:AkademIndex/openalex/2004.article.000261

4. Direct writing with an MeV proton beam: Development and Applications

   Vaida Auzelyte

   DissertationElectron and X-Ray Spectroscopy TechniquesLund University Publications (Lund University)20060 citations

   ABIABI:AkademIndex/openalex/2006.dissertation.000004

5. Prospects for the development of optical systems for nanolithography

   А. Б. Бельский, M. A. Gan, I. A. Mironov +1

   ArticleAdvancements in Photolithography TechniquesJournal of Optical Technology20090 citations

   ABIABI:AkademIndex/openalex/2009.article.000086

6. Cost efficient master fabrication process on copper substrates

   Simone Luigi Marasso, Giancarlo Canavese, Matteo Cocuzza

   ArticleNanofabrication and Lithography TechniquesMicroelectronic Engineering20110 citations

   ABIABI:AkademIndex/openalex/2011.article.000087

7. THE VARIOUS COLLINEAR TERNARY FISSION DECAYS IN ²⁵²Cf(sf)

   W. von Oertzen, A. K. Nasirov, Yu. V. Pyatkov +1

   ArticleAdvancements in Photolithography Techniques20150 citations

   ABIABI:AkademIndex/openalex/2015.article.000638

8. INDENTATION OF NEGATIVE PHOTORESIST FILMS FOR LIFT-OFF LITHOGRAPHY

   С. А. Вабищевич, Д. И. Бринкевич, В. С. Просолович +4

   ArticleMetal and Thin Film MechanicsHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 citations

   ABIABI:AkademIndex/openalex/2025.article.001632