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Effect of high-dose low-energy reactive-ion implantation on cold cathode properties

Flyura DjurabekovaInstitute of Applied Physics, Uzbek National University, Vuzgorodok, Tashkent 700095, UzbekistanБ. Е. УмирзаковTashkent State Technical University, Universitetskaya, 2, Tashkent, 700095, UzbekistanF. F. UmarovInstitute of Applied Physics, Uzbek National University, Vuzgorodok, Tashkent 700095, UzbekistanY. MiyagawaNational Institute of Advanced Industrial Science and Technology, 2266-98, Shimo-Shidami, Moriyama-ku, Nagoya, 463-8560 Japan
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