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Work: Studies of Implantation of O+ Ions into SiO2(001) Films at the Small-Angle Ion Bombardment
Applying low-energy ion implantation in the creation of nanocontacts on the surface of ultrathin semiconductor films
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ArticleIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201314 citationsABI