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Works cited by this work

7 works

Work: Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions

  1. Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods

    Б. Е. Умирзаков, Д. А. Ташмухамедова, М. К. Рузибаева +3

    ArticleMetal and Thin Film MechanicsTechnical Physics201315 citations
    ABI

  2. Applying low-energy ion implantation in the creation of nanocontacts on the surface of ultrathin semiconductor films

    D. M. Muradkabilov, Д. А. Ташмухамедова, Б. Е. Умирзаков

    ArticleIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201314 citations
    ABI

  3. Analysis of profiles of atomic distribution over the depth of Si-Me free nanofilm systems

    Б. Е. Умирзаков, З. А. Исаханов, М. К. Рузибаева +2

    ArticleSemiconductor materials and interfacesTechnical Physics20155 citations
    ABI

  4. Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures

    З. А. Исаханов, Tulkin Kodirov, A. S. Halmatov +3

    ArticleMetal and Thin Film MechanicsJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20173 citations
    ABI

  5. Preparation of Step-free Single Crystal Metal Films with Desired Surface Orientations by Means of Vacuum Evaporation

    Kenji Wakashima, Masatoshi Fukamachi, Sigemaro Nagakura

    Article19692 citations
    ABI

  6. On the origin of the 1.5 μm luminescence in ion beam synthesized β-FeSi2

    D. Leong, M. Harry, K.J. Reeson +1

    Article19962 citations
    ABI

  7. A study of the orientation dependence of the electron energy loss spectra for single crystal films of copper and silver

    А. А. Алиев, З. А. Исаханов, М. К. Рузибаева

    ArticleElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20121 citations
    ABI