Works citing this work

3 works

Work: Preparation of manganese silicide thin films by solid phase reaction

1. About the mechanism of formation and growth of the higher manganese silicide films on silicon

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +6

   ArticleSemiconductor materials and interfaces20053 citations

   ABIABI:AkademIndex/openalex/2026.other.424565

2. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   ArticleSemiconductor materials and interfacesTechnical Physics20102 citations

   ABIABI:AkademIndex/openalex/2026.other.199251

3. Growth technique and structural properties of the higher manganese silicide films

   T. S. Kamilov, D.K. Kabilov, I.S. Samiev +3

   ArticleSemiconductor materials and interfaces20051 citations

   ABIABI:AkademIndex/openalex/2026.other.609626