Works citing this work

3 works

Work: Studies of formation of silicides and their barrier heights to silicon

1. Role of the silicon dioxide in formation of higher manganese silicide films

   T. S. Kamilov, A.A. Uzokov, D.K. Kabilov +3

   ArticleAdvanced Thermoelectric Materials and Devices20042 citations

   ABIABI:AkademIndex/openalex/2004.article.000220

2. On the growth of higher manganese silicide films on silicon

   Andrey Orekhov, T. S. Kamilov, Abdumalik Gaibov +2

   ArticleSemiconductor materials and interfacesTechnical Physics20102 citations

   ABIABI:AkademIndex/openalex/2026.other.199251

3. Study of the temperature dependence of the electrophysical and crystal structure of a thin coating of manganese silicide

   B.D. Igamov, A.I. Kamardin, I.R. Bekpulatov +1

   ArticleSemiconductor materials and interfacesMaterials Today Communications20260 citations

   ABIABI:AkademIndex/openalex/2026.article.000612