Works cited by this work

5 works

Work: Effect of Co+-ion implantation on the composition and properties of free Si–Cu nanofilm structures

1. Structure and electronic properties of nanoscale phases and nanofilms of metal silicides produced by ion implantation in combination with annealing

   Kh. Kh. Boltaev, Д. А. Ташмухамедова, Б. Е. Умирзаков

   ArticleSemiconductor materials and interfacesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201414 citations

   ABIABI:AkademIndex/openalex/2026.other.196457

2. Analysis of profiles of atomic distribution over the depth of Si-Me free nanofilm systems

   Б. Е. Умирзаков, З. А. Исаханов, М. К. Рузибаева +2

   ArticleSemiconductor materials and interfacesTechnical Physics20155 citations

   ABIABI:AkademIndex/openalex/2026.other.495098

3. Ion Implantation

   H. Ryssel

   Book19733 citations

   ABIABI:AkademIndex/openalex/2026.other.351368

4. Depth profiles of metal ions implanted in dielectrics at low energies

   А. Л. Степанов, В. А. Жихарев, И. Б. Хайбуллин

   Article20012 citations

   ABIABI:AkademIndex/openalex/2026.other.158193

5. Energy distribution of metal and noble gas ions traversing single-crystal copper films

   З. А. Исаханов

   ArticleIon-surface interactions and analysisTechnical Physics20122 citations

   ABIABI:AkademIndex/openalex/2026.other.531187