Работы, цитирующие эту работу

Работ: 2

Работа: Oxide mediated epitaxy of CoSi2 on silicon

1. Nanodimensional CoSiO Films Obtained by Ion Implantation on a CoSi2 Surface

   S. B. Donaev

   СтатьяSemiconductor materials and devicesTechnical Physics Letters2020Цитирований: 4

   ABIABI:AkademIndex/openalex/2026.other.402218

2. Obtaining nanoscale CoSiO/Si/CoSi₂ systems for increasing the range of light ray absorption energy

   S. B. Donaev, Б. Е. Умирзаков, D U Sobirova +2

   СтатьяSilicon Nanostructures and PhotoluminescenceIOP Conference Series Earth and Environmental Science2020Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.213642