Работы, цитирующие эту работу

Работ: 3

Работа: Formation of manganese silicide nanowires on Si(111) surfaces by the reactive epitaxy method

1. Formation of Nanosized Films of Chromium Silicides on Silicon Surface

   Makhmudhodzha Isaev, Abdumalik Gaibov, Abdigani Eshkulov +1

   ГлаваSemiconductor materials and interfacesLecture notes in networks and systems2021Цитирований: 3

   ABIABI:AkademIndex/openalex/2026.other.401148

2. Electronic Structure and Properties of Nanoscale Structures Created on the Surface of a Free Si/Cu Film System

   З. А. Исаханов, R. M. Yorkulov, Б. Е. Умирзаков +2

   СтатьяIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques2021Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.402219

3. Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation

   Б. Е. Умирзаков, М. К. Рузибаева, З. А. Исаханов +1

   СтатьяIon-surface interactions and analysisTechnical Physics2019Цитирований: 2

   ABIABI:AkademIndex/openalex/2026.other.492991