Работы, цитирующие эту работу

Работ: 2

Работа: Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies

1. Apparatus for growing GaN films on large-area substrates by the method of chloride-hydride vapor-phase epitaxy

   С. И. Степанов, D. Tsvetkov, A. E. Cherenkov

   СтатьяGaN-based semiconductor devices and materialsTechnical Physics Letters1998Цитирований: 0

   ABIABI:AkademIndex/openalex/1998.article.000248

2. 4H-SiC pn Diode Grown by LPE Method for High-Power Applications

   N.I. Kuznetsov, D. A. Bauman, A.V. Gavrilin +6

   СтатьяSilicon Carbide Semiconductor TechnologiesMaterials science forum2003Цитирований: 0

   ABIABI:AkademIndex/openalex/2003.article.000320