Chin‐Che Tin

2 та иш

Department of Physics, Auburn University, Alabama 36849, USA

1. Oxide film assisted dopant diffusion in silicon carbide

   Chin‐Che Tin, Suwan Mendis, Kerlit Chew +6

   МақолаSilicon and Solar Cell TechnologiesThin Solid Films20105 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.390738

2. Influence of Defects on Low Temperature Diffusion of Boron in SiC

   I. G. Atabaev, Tojiddin M. Saliev, Dilmurad SAIDOV +5

   МақолаSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications20114 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.390730