Tojiddin M. Saliev

3 та иш

Physical Technical Institute, Uzbek Academy of Sciences, 700084 Tashkent, Uzbekistan

1. Oxide film assisted dopant diffusion in silicon carbide

   Chin‐Che Tin, Suwan Mendis, Kerlit Chew +6

   МақолаSilicon and Solar Cell TechnologiesThin Solid Films20105 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.390738

2. Nonequilibrium Diffusion of Boron in SiC at Low Temperatures

   Iikham G. Atabaev, Tojiddin M. Saliev, É. N. Bakhranov +6

   МақолаSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications20105 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.390741

3. Influence of Defects on Low Temperature Diffusion of Boron in SiC

   I. G. Atabaev, Tojiddin M. Saliev, Dilmurad SAIDOV +5

   МақолаSilicon Carbide Semiconductor TechnologiesMaterials Sciences and Applications20114 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.390730