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NDR in Co:SnO <sub>2</sub> Memristors: Nanocluster Control for Enhanced Performance

Jamoliddin X. MurodovCenter for Nanotechnologies Development, National University of Uzbekistan, University Street 4, Tashkent 100174, UzbekistanSh. U. YuldashevCenter for Nanotechnologies Development, National University of Uzbekistan, University Street 4, Tashkent 100174, UzbekistanAzamat O. ArslanovDepartment of Physics, National University of Uzbekistan, University Street 4, Tashkent 100174, UzbekistanNoiba U. BotirovaCenter for Nanotechnologies Development, National University of Uzbekistan, University Street 4, Tashkent 100174, UzbekistanRa’no Sh. SharipovaCenter for Nanotechnologies Development, National University of Uzbekistan, University Street 4, Tashkent 100174, UzbekistanJavohir Sh. KhudoykulovDepartment of Physics, National University of Uzbekistan, University Street 4, Tashkent 100174, Uzbekistan
Crystal Growth & Designjournal2025en
ABI

Аннотация

This study investigates the negative differential resistance (NDR) effect in Co:SnO2 memristors fabricated using the ultrasonic spray pyrolysis (USP) method on p-Si/SiO2 substrates. The memristor devices, with a structure of p-Si/SiO2/Co:SnO2, exhibit distinct NDR behavior in their current–voltage (I–V) characteristics, characterized by a region of decreasing current with increasing voltage. Furthermore, the Tauc plot method is employed to determine the changes in the optical band gap of the Co:SnO2 material. This work focuses on evaluating the nanocluster size within the Co:SnO2 film, alongside changes in the optical band gap, and their potential relationship to the observed NDR effect. The results reveal a correlation between nanocluster characteristics, optical band gap variations, and NDR behavior, offering insights into charge transport mechanisms in these devices. This study contributes to the understanding of NDR in metal oxide memristors and offers potential avenues for tailoring device performance through nanostructural and electronic property control.

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