Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Structure of МеSi Silicide Films (Me: Li, Rb, K and Cs) According to Electron Microscopy Data and the Diffraction of Slow Electrons

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2. Optimum technological modes of ion implantation and subsequent annealing for formation of thin nanosized silicide films

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