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Иш: Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions
Applying low-energy ion implantation in the creation of nanocontacts on the surface of ultrathin semiconductor films
D. M. Muradkabilov, Д. А. Ташмухамедова, Б. Е. Умирзаков
МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201314 иқтибосABIOn the origin of the 1.5 μm luminescence in ion beam synthesized β-FeSi2
D. Leong, M. Harry, K.J. Reeson +1
Мақола19962 иқтибосABIA study of the orientation dependence of the electron energy loss spectra for single crystal films of copper and silver
А. А. Алиев, З. А. Исаханов, М. К. Рузибаева
МақолаElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20121 иқтибосABI